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Effect of Annealing Temperature on the Optical Spectra of CdS Thin Films Deposited at Low Solution Concentrations by Chemical Bath Deposition (CBD) Technique

机译:退火温度对化学浴镀(CBD)技术在低溶液浓度下沉积的CdS薄膜光学光谱的影响

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摘要

Two different concentrations of CdCl2 and (NH2)2CS were used to prepare CdS thin films, to be deposited on glass substrate by chemical bath deposition (CBD) technique. CdCl2 (0.000312 M and 0.000625 M) was employed as a source of Cd2+ while (NH2)2CS (0.00125 M and 0.000625 M) for S2− at a constant bath temperature of 70 °C. Adhesion of the deposited films was found to be very good for all the solution concentrations of both reagents. The films were air-annealed at a temperature between 200 °C to 360 °C for one hour. The minimum thickness was observed to be 33.6 nm for film annealed at 320 °C. XRD analyses reveal that the films were cubic along with peaks of hexagonal phase for all film samples. The crystallite size of the films decreased from 41.4 nm to 7.4 nm with the increase of annealing temperature for the CdCl2 (0.000312 M). Optical energy band gap (Eg), Urbach energy (Eu) and absorption coefficient (α) have been calculated from the transmission spectral data. These parameters have been discussed as a function of annealing temperature and solution concentration. The best transmission (about 97%) was obtained for the air-annealed films at higher temperature at CdCl2 (0.000312 M).
机译:使用两种不同浓度的CdCl2和(NH2)2CS制备CdS薄膜,然后通过化学浴沉积(CBD)技术沉积在玻璃基板上。在70°C的恒定浴温下,使用CdCl2(0.000312 M和0.000625 M)作为Cd2 +的来源,同时使用S2-的(NH2)2CS(0.00125 M和0.000625 M)。发现对于两种试剂的所有溶液浓度,沉积膜的粘附性都非常好。将膜在200℃至360℃的温度下空气退火1小时。对于在320℃退火的膜,观察到最小厚度为33.6nm。 XRD分析表明,所有薄膜样品的薄膜均为六方相峰。随着CdCl2(0.000312 M)退火温度的增加,薄膜的微晶尺寸从41.4 nm减小到7.4 nm。根据透射光谱数据计算出光能带隙(Eg),Urbach能量(Eu)和吸收系数(α)。这些参数已作为退火温度和溶液浓度的函数进行了讨论。在较高温度下于CdCl2(0.000312 M)的空气退火膜获得最佳透射率(约97%)。

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